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Electron beam lithography
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51	PDF Document Add to Reading List Source URL: www.nist.gov Language: English - Date: 2012-11-27 13:22:52 Emerging technologies Microtechnology Nanomaterials Mechanical engineering Microelectromechanical systems Transducers Electron beam lithography Nanolithography Photolithography Materials science Physics Technology
52	Thermoelectric Energy Harvesting Prof Douglas Paul Director: James Watt Nanofabrication Centre University of Glasgow U.K. Add to Reading List Source URL: www.ict-energy.eu Language: English - Date: 2014-05-08 07:11:46 Microtechnology Electricity Thermodynamics Electrical engineering Mechanical engineering Microelectromechanical systems Nanowire Nanoelectronics Electron beam lithography Electromagnetism Physics Technology
53	Microsoft Word - Balestra vol1_Prelims i-iv incl PCN Add to Reading List Source URL: media.wiley.com Language: English - Date: 2014-05-21 19:19:02 Semiconductor device fabrication Photolithography Nanowire Electron beam lithography Resist Proximity effect Stepper 65 nanometer Hydrogen silsesquioxane Materials science Microtechnology Nanotechnology
54	DRAFT MESSAGES FOR PRESS RELEASE OF LAUNCH: Add to Reading List Source URL: www.ebeam.org Language: English - Date: 2009-02-21 20:33:38 Display technology Office equipment EBeam Maskless lithography Advantest Application-specific integrated circuit Electron beam lithography Electronic design automation Semiconductor Equipment and Materials International Technology Electronic engineering Electronics
55	469 Index a ABSE 425 absorbed dose see exposure dose Add to Reading List Source URL: www.wiley-vch.de Language: English - Date: 2009-09-24 21:03:45 Chemistry LIGA Microelectromechanical systems Photoresist Photolithography Microfabrication Extreme ultraviolet lithography X-ray lithography Electron beam lithography Materials science Microtechnology Technology
56	Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r Add to Reading List Source URL: www.multibeamcorp.com Language: English - Date: 2014-06-26 13:06:22 Maskless lithography Photolithography Electron beam lithography Multiple patterning Resist Wafer Lithography Immersion lithography Photomask Technology Semiconductor device fabrication Microtechnology
57	Executive Briefing: Getting Direct On Litho Posted on: October 17th, [removed]Posted by : Mark LaPedus One-on-one with David Lam about next-generation lithography, where he’s placing his bets, and what’s changing in th Add to Reading List Source URL: www.multibeamcorp.com Language: English - Date: 2014-06-26 13:05:59 Semiconductor device fabrication Next-generation lithography Electron beam lithography Photolithography Visual arts Multiple patterning Nanoimprint lithography Lithography Wafer Technology Microtechnology Maskless lithography
58	Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond Cai Shen1,2 and Manfred Buck1 Add to Reading List Source URL: www.ncbi.nlm.nih.gov Language: English* Self-organization Supramolecular chemistry Underpotential deposition Thiol Electron beam lithography Chemistry Nanotechnology Self-assembled monolayer
59	Fabrication of carbon nanomembranes by helium ion beam lithography Xianghui Zhang, Henning Vieker, André Beyer and Armin Gölzhäuser Add to Reading List Source URL: www.ncbi.nlm.nih.gov Language: English* Radiobiology Charge carriers Semiconductor device fabrication Nanotechnology Electron beam Irradiation Electron beam processing Ionizing radiation Proximity effect Physics Chemistry Materials science
60	JOURNAL DE PHYSIQUE IV Colloque C9, supplement au Journal de Physique HI, Volume 4, novembre 1994 Add to Reading List Source URL: hal.archives-ouvertes.fr Language: English - Date: 2008-02-13 03:32:43 Visual arts Electron beam lithography Lithography Stepper Resist Design Technology Nanolithography X-ray lithography

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